In a typical deposition problem the substrate (or the 'host') is at a given temperature (and surrounded by a thermal bath), while the deposited species usually have a different temperature, which, a while after deposition, equilibrates to the substrate temperature.
Why then in this LAMMPS example file an NVE ensemble is used for a deposition problem? The number of atoms in the simulation box increases over time, which means total energy is not fixed. Wouldn't NVT make more sense for a deposition problem?