4
$\begingroup$

I know the differences between the two deposition techniques, but what about the difference in the properties of the resulting films? All things being equal (such as substrate temperature), would there be an intrinsic difference between sputtered or e-beam evaporated metal films in such properties as as thickness uniformity or stress?

| cite | improve this question | | | | |
$\endgroup$
2
$\begingroup$

Sputtering deposition is not normally preformed at ultra high vacuum pressures, thus the films tend to be polycrystalline while e-beam evaporated metal films could be done at much lower pressures resulting in a more uniform film, even single crystalline depending on other conditions like the substrate, lattice mismatch and so on. This is just one difference.

| cite | improve this answer | | | | |
$\endgroup$

Your Answer

By clicking “Post Your Answer”, you agree to our terms of service, privacy policy and cookie policy

Not the answer you're looking for? Browse other questions tagged or ask your own question.