I have a sample of a metal (aluminum/oxide) layer with a gradual thickness ranging from monolayer to 100nm. This layer is deposited on a transparent substrate, like glass. How can I measure this thickness variation across the sample, qualitatively or quantitatively?
Film thickness ranges from 0 to several nms. Film size, i.e. from left to right side of the image below, is about 10mm.
I know that Atomic force microscopy(AFM) and X-ray photoelectron spectroscopy(XPS) are two possible options. But are there any other simpler characterization techniques? Like some optical techniques (light absorption variation, etc)?